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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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Max frequency: 100kHz <br>
<b>Max frequency:</b> 100kHz <br>
Max reverse time: 10µs
<b>Max reverse time:</b> 10µs


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|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Max frequency: 100kHz <br>
<b>Max frequency:</b> 100kHz <br>
Max reverse time: 10µs
<b>Max reverse time:</b> 10µs


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HiPIMS Unit <br>
<b>HiPIMS Unit</b> <br>
Time Avg. Power: 1.5kW <br>
<b>Time Avg. Power:</b> 1.5kW <br>
Output Peak Voltage: <br>
<b>Output Peak Voltage:</b> <br>
-1000V nominal, <br>
-1000V nominal, <br>
-1250V tolerant <br>
-1250V tolerant <br>
Output Peak Current: <br>
<b>Output Peak Current:</b> <br>
200A nominal, <br>
200A nominal, <br>
400A toleran  
400A toleran  
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