Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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==Process information== | ==Process information== | ||
===Etch=== | ===Etch=== | ||
*[http://www. | *[http://www.semicore.com/reference/sputtering-yields-reference Compare sputter rates in different materials] | ||
*[[/IBE process trends|Some general process trends]] | *[[/IBE process trends|Some general process trends]] | ||
*[[/SIMS settings|SIMS settings]] | *[[/SIMS settings|SIMS settings]] | ||