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==Quality control (QC) for the Thermal evaporator==
==''Proposed quality'' control (QC) procedure for the Thermal evaporator==


{| border="1" cellspacing="2" cellpadding="2" colspan="3"
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality control (QC) for the Temescal'''
|bgcolor="#98FB98" |'''Quality control (QC) for the Thermal evaporator'''
|-
|-
|
|
*[http://labmanager.dtu.dk/d4Show.php?id=5862&mach=429 QC procedure for the Temescal]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=5862&mach=404 QC procedure for the Thermal Evaporator]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=429 The newest QC data for the Temescal]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=404 The newest QC data for the Thermal evaporator]<br>


{| {{table}}
{| {{table}}
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! QC Recipe:
! QC Recipe:
! Ti / Au
! Al
! other metal (if present, Al)
! Ag
|-  
|-  
|Deposition rate
|Deposition rate
|10 Å/s
|2 Å/s
|10 Å/s
|5 Å/s
|-
|-
|Thickness
|Thickness
|10 nm / 90 nm
|200 nm  
|100 nm
|200 nm
|-  
|-  
|Pressure
|Pressure
|Below 1*10<sup>-6</sup> mbar
|Below 1*10<sup>-5</sup> Torr
|Below 1*10<sup>-6</sup> mbar
|Below 1*10<sup>-5</sup> Torr
|-
|-
|}
|}
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|-
|-
|Deposition rate deviation
|Deposition rate deviation
|± 20 %
|± 1 Å/s after stabilizing
|-
|-
|Measured average thickness
|Measured average thickness
|± 10 %
|± 20 %
|-
|-
|Thickness deviation across a 4" wafer
|Thickness deviation across a 4" wafer
|± 5 %
|± 30 %
|-
|-
|}
|}
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Thicknesses are measured in 5 points with one of the Dektak instruments. <br>
Thicknesses are measured in 5 points with one of the Dektak instruments. <br>
Additionally we examine the newly deposited films for particles using the particle scanner (if available, otherwise we use the Jenatech microscope in darkfield mode) and we monitor the sheet resistance of the Ti/Au and Al films.
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