Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 01|Aligner: Maskless 01]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 01|Aligner: Maskless 01]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 02|Aligner: Maskless 02]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 02|Aligner: Maskless 02]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 03|Aligner: Maskless 03]]</b> | |||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Inclined UV Lamp|Inclined UV Lamp]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Inclined UV Lamp|Inclined UV Lamp]]</b> | ||
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*Top Side Alignment | *Top Side Alignment | ||
*Maskless UV exposure | |||
|style="background:WhiteSmoke; color:black"| | |||
*Top Side Alignment | |||
*Back Side Alignment | |||
*Maskless UV exposure | *Maskless UV exposure | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*1µm down to 0.6µm | *1µm down to 0.6µm | ||
|style="background:WhiteSmoke; color:black"| | |||
*2µm down to 1µm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
|- | |- | ||
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*375nm laserdiodes | *375nm laserdiodes | ||
or | or | ||
*405nm laserdiodes | |||
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*405nm laserdiodes | *405nm laserdiodes | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
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*Projection | *Projection | ||
**Optical auto-focus | **Optical auto-focus | ||
**Pneumatic auto-focus | |||
|style="background:WhiteSmoke; color:black"| | |||
*Projection | |||
**Pneumatic auto-focus | **Pneumatic auto-focus | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
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*1 150 mm wafer | *1 150 mm wafer | ||
*1 200 mm wafer | *1 200 mm wafer | ||
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*1 small sample, down to 5x5 mm<sup>2</sup> | |||
*1 50 mm wafer | |||
*1 100 mm wafer | |||
*1 150 mm wafer | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*all sizes up to 8inch | *all sizes up to 8inch | ||
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*All cleanroom materials except copper and steel | *All cleanroom materials except copper and steel | ||
*Dedicated chuck for III-V materials | *Dedicated chuck for III-V materials | ||
|style="background:WhiteSmoke; color:black"| | |||
*All cleanroom materials | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All cleanroom materials | *All cleanroom materials | ||