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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,530 edits
Line 318: Line 318:
|-
|-
|Nominal intensity
|Nominal intensity
|8 mW/cm<sup>2</sup> @ 365 nm
|11 mW/cm<sup>2</sup> @ 365 nm
|-
|-
|Intensity deviation from nominal
|Intensity deviation from nominal
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