Jump to content

Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

Taran (talk | contribs)
Taran (talk | contribs)
Line 296: Line 296:
|-
|-
|
|
*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=44 The QC procedure for KS Aligner]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=339 The QC procedure for Aligner: MA6-2]<br>
*[http://labmanager.dtu.dk/view_binary.php?fileId=3838 The newest QC data for KS Aligner]
*[http://labmanager.dtu.dk/view_binary.php?fileId=3838 The newest QC data for Aligner: MA6-2]
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |  
Line 313: Line 313:
|}
|}
| align="center" valign="top"|
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:300px"
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
!QC limits
!QC limits
!KS Aligner
!Aligner: MA6-2
|-
|-
|Nominal intensity
|Nominal intensity
|8 mW/cm<sup>2</sup>
|8 mW/cm<sup>2</sup> @ 365 nm
|-
|-
|Intensity deviation from nominal
|Intensity deviation from nominal
Line 331: Line 331:
Power supply and/or lamp will be adjusted if intensity is outside the limit.
Power supply and/or lamp will be adjusted if intensity is outside the limit.
|}
|}


====Alignment====
====Alignment====