Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach= | *[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=339 The QC procedure for Aligner: MA6-2]<br> | ||
*[http://labmanager.dtu.dk/view_binary.php?fileId=3838 The newest QC data for | *[http://labmanager.dtu.dk/view_binary.php?fileId=3838 The newest QC data for Aligner: MA6-2] | ||
{| {{table}} | {| {{table}} | ||
| align="center" | | | align="center" | | ||
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|} | |} | ||
| align="center" valign="top"| | | align="center" valign="top"| | ||
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width: | {| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px" | ||
!QC limits | !QC limits | ||
! | !Aligner: MA6-2 | ||
|- | |- | ||
|Nominal intensity | |Nominal intensity | ||
|8 mW/cm<sup>2</sup> | |8 mW/cm<sup>2</sup> @ 365 nm | ||
|- | |- | ||
|Intensity deviation from nominal | |Intensity deviation from nominal | ||
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Power supply and/or lamp will be adjusted if intensity is outside the limit. | Power supply and/or lamp will be adjusted if intensity is outside the limit. | ||
|} | |} | ||
====Alignment==== | ====Alignment==== | ||