Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|Nominal intensity | |Nominal intensity | ||
|8 mW/cm<sup>2</sup> | |8 mW/cm<sup>2</sup> @ 365 nm | ||
|- | |- | ||
|Intensity deviation from nominal | |Intensity deviation from nominal | ||
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Power supply and/or lamp will be adjusted if intensity is outside the limit. | Power supply and/or lamp will be adjusted if intensity is outside the limit. | ||
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=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||