Specific Process Knowledge/Thin film deposition: Difference between revisions
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*[[/thermalevaporator|Thermal evaporator]] - ''Thermal evaporator'' | *[[/thermalevaporator|Thermal evaporator]] - ''Thermal evaporator'' | ||
*[[/Temescal|E Beam Evaporator (Temescal)]] | *[[/Temescal|E Beam Evaporator (Temescal)]] | ||
*[[/Physimeca|Physimeca]] - ''E-beam evaporator | *[[/Physimeca|Physimeca]] - ''E-beam evaporator'' | ||
*[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] - ''Sputter deposition of high quality optical layers and milling/etching'' | *[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] - ''Sputter deposition of high quality optical layers and milling/etching'' | ||
*[[/Sputter coater#Sputter_coater_03_(Cressington)|Sputter coater 03]] - ''Gold sputtering system'' | *[[/Sputter coater#Sputter_coater_03_(Cressington)|Sputter coater 03]] - ''Gold sputtering system'' | ||