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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 166: Line 166:


{| border="1" cellspacing="2" cellpadding="2" colspan="3"
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for Spin coater: Süss Stepper - BARC DUV42S-6 [[Image:section under construction.jpg|70px]] '''
|bgcolor="#98FB98" |'''Quality Control (QC) for KS Aligner [[Image:section under construction.jpg|70px]] '''
|-
|-
|
|
*[http://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=44 The QC procedure for KS Aligner]<br>
*[http://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper]
*[http://labmanager.dtu.dk/view_binary.php?fileId=3838 The newest QC data for KS Aligner]
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |  
{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:400px"
{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:300px"


! QC Recipe:
! QC Recipe:
! (1201) DCH 150mm BARC 65nm
! Manual intensity measurement
|-  
|-  
|Substrate size
|Measurement area
|6"
|4"
|-  
|-  
|Resist volume
|Number of measurements
|3 ml
|5
|-
|Spin-off speed
|4700 rpm
|-
|Spin-off time
|30 s
|-
|Soft bake temperature
|175°C, contact
|-
|Soft bake time
|60 s
|-
|-
|}
|}
| align="center" valign="top"|
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:300px"
!QC limits
!QC limits
!Spin coater: Süss Stepper - BARC DUV42S-6
!KS Aligner
|-
|-
|Nominal film thickness
|Nominal intensity
|65 nm
|8 mW/cm2
|-
|-
|Film thickness deviation from nominal
|Intensity deviation from nominal
|<15%
|<5%
|-
|-
|Film thickness non-uniformity
|Intensity non-uniformity
|<5%
|<2%
|-
|-
|}
|}
|-
|-
|}
|}
Spin-off speed will be adjusted if film thickness is outside the limit.
Power supply and/or lamp will be adjusted if intensity is outside the limit.
|}
|}


=== Equipment performance and process related parameters ===
=== Equipment performance and process related parameters ===
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/UVExposure"