Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]] | *[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]] | ||
====Quality Control (QC)==== | |||
====Alignment==== | ====Alignment==== | ||
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**Low: 1.5mm x 2mm (3mm x 2mm full field) | **Low: 1.5mm x 2mm (3mm x 2mm full field) | ||
**High: 450µm x 650µm (950µm x 650µm full field) | **High: 450µm x 650µm (950µm x 650µm full field) | ||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||