Specific Process Knowledge/Thermal Process: Difference between revisions

Revision as of 11:09, 6 March 2020 view source Pevo (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 2,330 edits →Rules for storage and RCA cleaning of wafers to the A and C stack furnaces ← Older edit		Revision as of 11:12, 6 March 2020 view source Pevo (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 2,330 edits →Manuale for the furnace computer to the A, B, C and E stack furnaces Newer edit →
Line 35:		Line 35:


	== ~~Manuale~~ for the furnace computer to the A, B, C and E stack furnaces ==		== Manual for the furnace computer to the A, B, C and E stack furnaces ==

	Furnace_computer_manual.pdf		Furnace_computer_manual.pdf