Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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==Aligner: Maskless 02== | ==Aligner: Maskless 02== | ||
'''Feedback to this section''': '''[mailto:lithography@Nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02 click here]''' | '''Feedback to this section''': '''[mailto:lithography@Nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02 click here]''' | ||
MLA150 maskless aligner from Heidelberg Instruments GmbH. | |||
Special features: | Special features: | ||