Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions

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	== Rules for storage and RCA cleaning of wafers to the B2 and E4 furnaces ==		== Rules for storage and RCA cleaning of wafers to the B4 and E2 furnaces ==

	*[[Specific_Process_Knowledge/Thermal_Process/Storage_and_cleaning_of_wafer_to_the_A,_B,_C_and_E_stack_furnaces\|Storage and cleaning of wafer to the B2 and E4 furnaces]]		*[[Specific_Process_Knowledge/Thermal_Process/Storage_and_cleaning_of_wafer_to_the_A,_B,_C_and_E_stack_furnaces\|Storage and cleaning of wafer to the B4 and E2 furnaces]]