Specific Process Knowledge/Lithography/Development: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development click here]''' | ||
== | ==Development Comparison Table== | ||
{| border="2" cellspacing="0" cellpadding="2" | {| border="2" cellspacing="0" cellpadding="2" | ||
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[[Image:Developer1&2.jpg|300x300px|thumb|right|Developer-1 (right) and Developer-2 (left) are located in C-1]] | [[Image:Developer1&2.jpg|300x300px|thumb|right|Developer-1 (right) and Developer-2 (left) are located in C-1]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer-1_and_Developer-2 click here]''' | ||
===<span style="color:red">This equipment was decommissioned January 2017!</span>=== | ===<span style="color:red">This equipment was decommissioned January 2017!</span>=== | ||
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Developer-1 and Developer-2 are manual developer baths for submersion development of AZ 5214E and AZ 4562 resists in AZ 351B developer. The developer is mixed 1:5 in water by the user prior to development start, and the wafer cassette is agitated manually by the user during development. The development time is controlled manually by the user. After development, the substrates are rinsed with water in the bench. | Developer-1 and Developer-2 are manual developer baths for submersion development of AZ 5214E and AZ 4562 resists in AZ 351B developer. The developer is mixed 1:5 in water by the user prior to development start, and the wafer cassette is agitated manually by the user during development. The development time is controlled manually by the user. After development, the substrates are rinsed with water in the bench. | ||
'''The user APV, and contact information can be found in LabManager: [http://labmanager | '''The user APV, and contact information can be found in LabManager: [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=62 Developer-1] [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=63 Developer-2]''' | ||
===Process information=== | ===Process information=== | ||
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[[image:6inchDeveloper.jpg|300x300px|right|thumb|The Developer: 6inch bench is located in E-4]] | [[image:6inchDeveloper.jpg|300x300px|right|thumb|The Developer: 6inch bench is located in E-4]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Developers#Developer-6inch click here]''' | ||
===<span style="color:red">This equipment will be decommissioned December 2019!</span>=== | ===<span style="color:red">This equipment will be decommissioned December 2019!</span>=== | ||
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The Developer: 6inch bench is an automated developer bath for submersion development of AZ 5214E and AZ 4562 resists in AZ 351B developer. The developer is mixed 1:5 in water by the equipment prior to development start. The developer is circulated during development, and the wafer cassette may be agitated by a mechanical elevator. The development time is controlled manually by the user. After development, the substrates are rinsed with water in the bench. | The Developer: 6inch bench is an automated developer bath for submersion development of AZ 5214E and AZ 4562 resists in AZ 351B developer. The developer is mixed 1:5 in water by the equipment prior to development start. The developer is circulated during development, and the wafer cassette may be agitated by a mechanical elevator. The development time is controlled manually by the user. After development, the substrates are rinsed with water in the bench. | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager | '''The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=189 LabManager]''' | ||
===Process information=== | ===Process information=== | ||
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[[Image:SU-8developer.jpg|300x300px|right|thumb|The SU8-Developer bench is located in C-1]] | [[Image:SU-8developer.jpg|300x300px|right|thumb|The SU8-Developer bench is located in C-1]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#SU8-Developer click here]''' | ||
The SU8-Developer bench is a manually operated chemical bench for submersion development of SU-8 photoresist in PGMEA (supplied in the cleanroom as mr-Dev 600). The development process is in two stages; one bath (FIRST) to dissolve the bulk of the resist, and a second, cleaner bath (FINAL) to finish the development. The development time is controlled manually by the user. After development, the substrates are rinsed with IPA and dried in the bench. | The SU8-Developer bench is a manually operated chemical bench for submersion development of SU-8 photoresist in PGMEA (supplied in the cleanroom as mr-Dev 600). The development process is in two stages; one bath (FIRST) to dissolve the bulk of the resist, and a second, cleaner bath (FINAL) to finish the development. The development time is controlled manually by the user. After development, the substrates are rinsed with IPA and dried in the bench. | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager | '''The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=154 LabManager]''' | ||
===Process information=== | ===Process information=== | ||
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[[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam Manual is located in E-4]] | [[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam Manual is located in E-4]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual click here]''' | ||
Developer: E-beam Manual is a manually operated, single substrate or chip spray-puddle developer. It uses the N50 or AR 600-546 developers and IPA for rinsing. The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, water rinse, and drying is performed automatically by the equipment. | Developer: E-beam Manual is a manually operated, single substrate or chip spray-puddle developer. It uses the N50 or AR 600-546 developers and IPA for rinsing. The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, water rinse, and drying is performed automatically by the equipment. | ||
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'''[http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.049_Developer_Manual-720p.mp4 Training video]''' | '''[http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.049_Developer_Manual-720p.mp4 Training video]''' | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager | '''The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager]''' | ||
===Process information=== | ===Process information=== | ||
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[[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: TMAH Manual is located in E-4]] | [[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: TMAH Manual is located in E-4]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual click here]''' | ||
Developer: TMAH Manual is a manually operated, single substrate or chip spray-puddle developer. It uses the TMAH based AZ 726 MIF developer (2.38 % TMAH in water with a small amount of wetting agent). The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, water rinse, and drying is performed automatically by the equipment. | Developer: TMAH Manual is a manually operated, single substrate or chip spray-puddle developer. It uses the TMAH based AZ 726 MIF developer (2.38 % TMAH in water with a small amount of wetting agent). The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, water rinse, and drying is performed automatically by the equipment. | ||
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'''[http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.049_Developer_Manual-720p.mp4 Training video]''' | '''[http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.049_Developer_Manual-720p.mp4 Training video]''' | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager | '''The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager]''' | ||
===Process information=== | ===Process information=== | ||
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'''Utility recipes''' | '''Utility recipes''' | ||
*UTIL-DR: Dome rinse. | *UTIL-DR: Dome rinse. | ||
*UTIL-BE: Bottle empty. | *UTIL-BE: Bottle empty. Nanolab use only. | ||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||
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[[Image:SUSS DEV.JPG|300x300px|right|thumb|Developer: TMAH UV-lithography is located in E-4]] | [[Image:SUSS DEV.JPG|300x300px|right|thumb|Developer: TMAH UV-lithography is located in E-4]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography click here]''' | ||
Developer TMAH UV-lithography was released Q4 2014. | Developer TMAH UV-lithography was released Q4 2014. | ||
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'''[http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.050_Developer_TMAH_UV-Lithography-720p.mp4 Training video]''' | '''[http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.050_Developer_TMAH_UV-Lithography-720p.mp4 Training video]''' | ||
'''The user manual, user APV, and contact information can be found in [http://labmanager | '''The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=329 LabManager]''' | ||
===Process information=== | ===Process information=== | ||