Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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'''Feedback to this page''': '''[mailto:photolith@ | '''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure click here]''' | ||
== UV Exposure Comparison Table == | == UV Exposure Comparison Table == | ||
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[[Image:KSAligner in E-4.jpg|300x300px|thumb|The KS Aligner is placed in E-4]] | [[Image:KSAligner in E-4.jpg|300x300px|thumb|The KS Aligner is placed in E-4]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner click here]''' | ||
SUSS Mask Aligner MA6 is designed for high resolution photolithography. | SUSS Mask Aligner MA6 is designed for high resolution photolithography. | ||
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'''Training videos: [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part1_operation-720p.mp4 Operation] [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part2_aligning-720p.mp4 Alignment]''' (on Aligner: MA6-2, but KS Aligner is the same model) | '''Training videos: [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part1_operation-720p.mp4 Operation] [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part2_aligning-720p.mp4 Alignment]''' (on Aligner: MA6-2, but KS Aligner is the same model) | ||
'''The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager | '''The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager].''' | ||
===Process information=== | ===Process information=== | ||
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[[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 2 is placed in E-4]] | [[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 2 is placed in E-4]] | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2 click here]''' | ||
The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography. | The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography. | ||
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'''Training videos: [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part1_operation-720p.mp4 Operation] [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part2_aligning-720p.mp4 Alignment]''' | '''Training videos: [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part1_operation-720p.mp4 Operation] [http://podcast.llab.dtu.dk/fileadmin/podcasts/2016/DTUDanchip/1.053_Aligner_MA6_part2_aligning-720p.mp4 Alignment]''' | ||
'''The user manual, APV, and contact information can be found in [http://labmanager | '''The user manual, APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager].''' | ||
===Process information=== | ===Process information=== | ||
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== Aligner: Maskless 01 == | == Aligner: Maskless 01 == | ||
'''Feedback to this section''': '''[mailto:lithography@ | '''Feedback to this section''': '''[mailto:lithography@Nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01 click here]''' | ||
[[Image:Heidelberg_MLA100.jpg|300x300px|thumb|Aligner: Maskless 01 positioned in E-5]] | [[Image:Heidelberg_MLA100.jpg|300x300px|thumb|Aligner: Maskless 01 positioned in E-5]] | ||
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'''The user manual and contact information can be found in LabManager:''' | '''The user manual and contact information can be found in LabManager:''' | ||
Equipment info in [http://labmanager | Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=422 LabManager] | ||
===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing|Process information]]=== | ===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing|Process information]]=== | ||
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==Aligner: Maskless 02[[Image:section under construction.jpg|70px]]== | ==Aligner: Maskless 02[[Image:section under construction.jpg|70px]]== | ||
'''Feedback to this section''': '''[mailto:lithography@ | '''Feedback to this section''': '''[mailto:lithography@Nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02 click here]''' | ||
===THIS SECTION IS UNDER CONSTRUCTION=== | ===THIS SECTION IS UNDER CONSTRUCTION=== | ||
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*Upgrade to 8" (stage and exposure area) | *Upgrade to 8" (stage and exposure area) | ||
Equipment info in [http://labmanager | Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=440 LabManager] | ||
===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing|Process information]]=== | ===[[Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing|Process information]]=== | ||
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==Inclined UV Lamp== | ==Inclined UV Lamp== | ||
'''Feedback to this section''': '''[mailto:labadviser@ | '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Inclined_UV_lamp click here]''' | ||
[[Image:Inclined UV lamp_1.jpg|300x300px|right|thumb|Inclined UV lamp is placed in E-5]] | [[Image:Inclined UV lamp_1.jpg|300x300px|right|thumb|Inclined UV lamp is placed in E-5]] | ||
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The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank. | The Inclined UV lamp is 1000 W Hg(Xe)lamp source designed for near UV, 350-450nm, mid UV, 260-320nm, and deep UV, 220-260nm exposures of resists and polymers. The exposure source can be also used to make an inclined exposure in air or in the media tank. | ||
The tool was purchased in February 2009 from Newport. The exposure lamp has a official name: Oriel Flood Exposure Source, unit 92540. All other parts of equipment: substrate and mask holder with media tank, exhaust box around the tool, timer controller, were designed and build at DTU | The tool was purchased in February 2009 from Newport. The exposure lamp has a official name: Oriel Flood Exposure Source, unit 92540. All other parts of equipment: substrate and mask holder with media tank, exhaust box around the tool, timer controller, were designed and build at DTU Nanolab workshop. | ||
The substrate and mask holder with a media tank was designed as part of Master Thesis of DTU Nanotech, Andres Kristensen group. The exhaust box was made as part of safety and the timer controller was build to control exposure time. | The substrate and mask holder with a media tank was designed as part of Master Thesis of DTU Nanotech, Andres Kristensen group. The exhaust box was made as part of safety and the timer controller was build to control exposure time. | ||
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The technical specification and the general outline of the equipment can be found in LabManager. | The technical specification and the general outline of the equipment can be found in LabManager. | ||
'''The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager | '''The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=259 LabManager].''' | ||
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