Jump to content

Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 248: Line 248:




'''Field of view of the alignment microscopes:'''
'''Microscope field of view (W x H, splitfield):'''
*TSA 5X:
*TSA 5X
*TSA 10X:
**Oculars: 1.3mm x 2.6mm (Ø2.6mm full field)
**Camera: 350µm x 500µm (700µm x 500µm full field)
*TSA 10X
**Oculars: 0.6mm x 1.3mm (Ø1.3mm full field)
**Camera: 150µm x 250µm (350µm x 250µm full field)
*TSA special:
*TSA special:
*BSA low:
*BSA low:
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/UVExposure"