Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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====Alignment==== | ====Alignment==== | ||
'''Top Side Alignment:''' | |||
*TSA microscope standard objectives: 5X, and 10X (20X available) | *TSA microscope standard objectives: 5X, and 10X (20X available) | ||
*TSA microscope special objectives: 11.25X offset (for smaller separation) | *TSA microscope special objectives: 11.25X offset (for smaller separation) | ||
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*TSA microscope travel range: X +/- 25mm; Y +20mm / -75mm (towards flat) | *TSA microscope travel range: X +/- 25mm; Y +20mm / -75mm (towards flat) | ||
'''BackSide Alignment:''' | |||
*Minimum distance between BSA microscope objectives: 15 mm | *Minimum distance between BSA microscope objectives: 15 mm | ||
*Maximum distance between BSA microscope objectives: 100 mm | *Maximum distance between BSA microscope objectives: 100 mm | ||