Specific Process Knowledge/Pattern Design: Difference between revisions
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===Alignment marks=== | ===Alignment marks=== | ||
The following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | The following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | ||
*[[Media:Alignmentkeys2.cif|Alignment marks 2 .cif]] - ''You need the program "Clewin" to open this file'' | *[[Media:Alignmentkeys2.cif|Alignment marks 2 .cif]] (Right click and Use "save link as...") - ''You need the program "Clewin" to open this file'' | ||
*[[Media:Alignmentkeys2.tdb|Alignment marks 2 .tdb]] - ''You need the program "L-Edit" to open this file'' | *[[Media:Alignmentkeys2.tdb|Alignment marks 2 .tdb]] - ''You need the program "L-Edit" to open this file'' | ||