Specific Process Knowledge/Thermal Process/Furnace Noble: Difference between revisions
| Line 61: | Line 61: | ||
| style="background:LightGrey; color:black"|Substrate material allowed | | style="background:LightGrey; color:black"|Substrate material allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Silicon samples (new from the box | *Silicon samples (new from the box) | ||
*Silicon samples with metals | *Silicon samples with metals | ||
*Silicon sample with polymers (only approved materials) | *Silicon sample with polymers (only approved materials) | ||
|- | |- | ||
|} | |} | ||
Revision as of 13:57, 10 July 2019
Feedback to this page: click here
Noble furnace
The Noble Furnace is used for annealing and oxidation of different samples. Annealing can be done in a nitrogen or argon atmosphere. A bubbler has also been installed in the furnace, so it is possible to do both wet and dry oxidations. The maximum temperature of the furnace is 1000 oC.
In the Noble Furnaces more dirty samples with metals and some specific polymers are allowed. Different sample holder are available for wafers and smaller samples (placed on a Si carrier wafer).
The furnace is located in service area Cx1.
Please check the cross contamination information in LabManager before you use the furnace.
The user manual, technical information and contact information can be found in LabManager:
Overview of the performance of the Noble Furnace
| Purpose |
|
Oxidation:
Annealing:
|
|---|---|---|
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Gasses on the system |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
|