Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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| style="background:LightGrey; color:black"|Possible masking material | | style="background:LightGrey; color:black"|Possible masking material | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *Photo resist/e-beam resist | ||
*Ti | *Ti | ||
*You are allowed to try with any of the materials on the list above. | *You are allowed to try with any of the materials on the list above. | ||
|- | |- | ||
|} | |} | ||