Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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*Ar sputter etch of various materials. For example many metals and alloys. | *Ar sputter etch of various materials. For example many metals and alloys. | ||
*Reactive Ion beam etch using F | *Reactive Ion beam etch using F | ||
*Sputter deposition of for example high quality optical layers | *Sputter deposition of for example high quality optical layers | ||
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