Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*High resolution (Write Mode I, including optical autofocus) | *High resolution (Write Mode I, including optical autofocus) | ||
*Back side alignment | *Back side alignment | ||
*Basic Gray Scale Exposure | |||
*Advanced Field Alignment Mode for alignment to individual chips/devices on the substrate | *Advanced Field Alignment Mode for alignment to individual chips/devices on the substrate | ||
*High Aspect Ratio Mode for exposure of thick resists | *High Aspect Ratio Mode for exposure of thick resists | ||