Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:LightGrey; color:black"|Minimum structure size | |style="background:LightGrey; color:black"|Minimum structure size | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
down to 600nm | down to 600nm <sup>1)</sup> | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Design formats | |style="background:LightGrey; color:black"|Design formats | ||
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* 100 mm wafer | * 100 mm wafer | ||
* 50 mm wafer | * 50 mm wafer | ||
* pieces down to 3x3 mm<sup>2</sup> | * pieces down to 3x3 mm<sup>2</sup> <sup>1)</sup> | ||
|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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|} | |} | ||
<sup>1)</sup> Optical autofocus | |||
<br clear="all" /> | <br clear="all" /> | ||