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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
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!style="background:silver; color:black" align="left" valign="center" rowspan="5"|Performance
!style="background:silver; color:black" align="left" valign="center" rowspan="6"|Performance


|style="background:LightGrey; color:black"|Exposure mode
|style="background:LightGrey; color:black"|Exposure mode
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|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
365nm (LED), FWHM=8nm
365nm (LED), FWHM=8nm
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|style="background:LightGrey; color:black"|Focusing method
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
Pneumatic
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|style="background:LightGrey; color:black"|Minimum structure size
|style="background:LightGrey; color:black"|Minimum structure size
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
down to 3µm
down to 1µm
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|style="background:LightGrey; color:black"|Design formats
|style="background:LightGrey; color:black"|Design formats
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