Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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!style="background:silver; color:black" align="left" valign="center" rowspan=" | !style="background:silver; color:black" align="left" valign="center" rowspan="6"|Performance | ||
|style="background:LightGrey; color:black"|Exposure mode | |style="background:LightGrey; color:black"|Exposure mode | ||
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|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
375nm or 405nm (laser diode arrays) | 375nm or 405nm (laser diode arrays) | ||
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|style="background:LightGrey; color:black"|Focusing method | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
*Optical | |||
*Pneumatic | |||
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|style="background:LightGrey; color:black"|Minimum structure size | |style="background:LightGrey; color:black"|Minimum structure size | ||
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|style="background:LightGrey; color:black"|Alignment modes | |style="background:LightGrey; color:black"|Alignment modes | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
Top side alignment | *Top side alignment | ||
Backside alignment | *Backside alignment | ||
Field alignment | *Field alignment | ||
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