Specific Process Knowledge/Pattern Design: Difference between revisions
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== Pattern Design == | == Pattern Design == | ||
For making a pattern on a substrate it is | For making a pattern on a substrate it is necessary to use a software tool to design the pattern layout. This counts for all kind of lithography and laser cutting. There are a number of differernt software tools that can be used, some of the more commonly used are: | ||
* CleWin | * CleWin | ||
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* Autocad | * Autocad | ||
At Danchip we offer all users '''free access to CleWin 5''' for their mask layout | At Danchip we offer all users '''free access to CleWin 5''' for their mask layout. | ||
[[/CleWin#CleWin 5 - local installation|'''Installation''' ]] of the CleWin 5 software on your local computer: [[/CleWin#CleWin 5 - local installation|Click here for guidelines.]] | |||
Find the official [[Media:CleWin5UserGuide.pdf |CleWin 5 User Guide here.]] The last document can also be found in the CleWin 5 installation directory | Find the official [[Media:CleWin5UserGuide.pdf |CleWin 5 User Guide here.]] The last document can also be found in the CleWin 5 installation directory of your local installation. | ||
=== Layout file format=== | === Layout file format=== | ||
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* For '''DUV-lithography''' and DUV-lithography it is necescary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticles see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]]. | * For '''DUV-lithography''' and DUV-lithography it is necescary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticles see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]]. | ||
== Mask Fabrication for UV-lithography == | == Mask Fabrication for UV-lithography == | ||