Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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[[Category: Equipment |Etch DRIE]] | [[Category: Equipment |Etch DRIE]] | ||
[[Category: Etch (Dry) Equipment|DRIE]] | [[Category: Etch (Dry) Equipment|DRIE]] | ||
[/Si Nano etching|Nanoscale silicon etching with SF6 and O2] | |||
Revision as of 13:06, 16 January 2019
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[/Si Nano etching|Nanoscale silicon etching with SF6 and O2]