Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/AFM Icon Acceptance

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AFM Icon 1 accessories and acceptance test

Accessories following the system

Equipment	AFM Icon	AFM Icon 2
Chucks	A symmetric chuck that handles up to 210mm wafers and 15mm thick An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample.	A symmetric chuck that handles up to 210mm wafers and 15mm thick
Holders	Magnetic sample holder + magnetic discs + double sided tape Holder for vertical profile scans	Magnetic sample holder + magnetic discs + double sided tape Holder for vertical profile scans ?
Modes included	ScanAsyst TappingMode (air) Contact Mode Lateral Force Microscopy PhaseImaging Lift mode MFM Force Spectroscopy Force volume EFM surface potential Torsional Resonance Mode Piezoresponse Microscopy Force spectroscopy Extra modes: PeakForce KPFM package (incl extra box for high voltage PF KPFM) PFQNM package Microscope Image Registration and Overlay (MIRO) software. this is only working in the old software (before version 9.4)	ScanAsyst TappingMode (air) Contact Mode Lateral Force Microscopy PhaseImaging Lift mode MFM Force Spectroscopy Force volume EFM surface potential Torsional Resonance Mode Piezoresponse Microscopy Force spectroscopy
	Up to 13µm	Up to 13µm
	<30pm RMS	<30pm RMS
	<0.15nm RMS	<0.15nm RMS
	35pm RMS	35pm RMS
	<0.5%	<0.5%
	<0.15nm RMS	<0.15nm RMS
	~1 for our standard probe. Can be improved to about 10 with the right probe	~1 for our standard probe. Can be improved to about 10 with the right probe
Hardware settings	Standard probe: <12 nm	Standard probe: <12 nm
	ScanAsyst in Air	ScanAsyst in Air
	Tap300Al-G	Tap300Al-G
	SSS-NCHR
	AR5-NCHR	AR5-NCHR
	Bruker www.nanoandmore.com	Bruker www.nanoandmore.com
Substrates	Up to 210mm in diameter and up to 15mm thick"	Up to 210mm in diameter and up to 15mm thick"
	180mmx150mm inspection area 2µm repeatability, unidirectional 3µm repeatability, bidirectional	180mmx150mm inspection area 2µm repeatability, unidirectional 3µm repeatability, bidirectional
	In principle all materials	In principle all materials

Extra chuck

We have two chucks:

• A symmetric chuck that handles up to 210mm wafers and 15mm thick

• An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample.

Holders

• Magnetic sample holder + magnetic discs + double sided tape
• Holder for vertical profile scans

Modes included

• ScanAsyst
• TappingMode (air)
• Contact Mode
• Lateral Force Microscopy
• PhaseImaging
• Lift mode
• MFM
• Force Spectroscopy
• Force volume
• EFM
• surface potential
• Torsional Resonance Mode
• Piezoresponse Microscopy
• Force spectroscopy

Extra modes:

• PeakForce KPFM package (incl extra box for high voltage PF KPFM)
• PFQNM package
• Microscope Image Registration and Overlay (MIRO) software. this is only working in the old software (before version 9.4)

Probes

Probes that followed the system (we may not have them anymore!)

	ScanAsyst mode	Tapping mode	Contact mode	PF-KPFM
Generel description	Generel description	Generel description
Probes that followed the system	ScanAsyst air 30ps ScanAsyst fluid 10ps ScanAsyst fluid + 10ps	MPP-11100-10 MPP-21100-10 MPP-11120-10 RTESPA TESPA-V2 10ps OTESPA-R3 10ps High Aspect ratio probes 1:15: FIB6-400A 5ps MPP-12120 10ps. Tap150A MPP-13120-10 TAP525A	SNL-10 20ps	SCM-PIT 10ps PFQNE-Al 10ps

Samples

• QC grid: VGRP-15M 10µm pitch and depth reference 178nm
• PF KPFM-SMPL Kelvin probe Sample: Al + Au on Si

Calibration samples for getting quantitative modulus measurements:

1. PDMS-soft-1-12M: PDMS gel 2.5MPa
2. PDMS-soft-2-12M: PDMS gel 3.5MPa
3. PSFilm-12M: Polystyrene filem
4. FSilica-12M: Fused Silica
5. Sapphire-12M: Sapphire
6. RS-12M: Ti roughness sample
7. HOPG-12M: Highly Orientated Pyrolytic Graphite
8. PS-LDPE: Harmonix training

• HOPG: Highly Oriented Pyrolytic Graphite

Acceptance tests done

Noise tests

Sensor noise

Tappingmode, OTESPA-R3 probe used.
First we made a false engage (scanning in air): Turn off gain 0 0
Z range 0.2my
Scan size 0.01nm
We saw some 50Hz noise (electrical - or maybe pumps): Rq 15 pm (specs 35pm)

System noise

Noise on sample: scan size 0.1nm
we started with 1my scan size to optimize the scan.
2.43Hz
256 lines
Z range at 2my to get sub nanometer resolution in Z
Rq: 54,5pm (plade vibrator koerte udenfor)
Rq: 23pm uden vibrator koerende + ro og med aaben hood.
Rq:71pm uden vibrator koerende + ro og med lukket hood

Roughness

HAR: 200nm wide 400nm deep

Graphene KPFM measurement

Height image: The graphene and structuring in graphene is not visible
Potential image: Potential difference between grapheme and non-graphene is visible
Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear