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Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions

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Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
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!style="background:silver; color:black" align="left" valign="top" rowspan="4"|Performance
!style="background:silver; color:black" align="left" valign="top" rowspan="4"|Performance
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
*10Å - 1µm* 
*10Å - 1µm
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|style="background:LightGrey; color:black"|Deposition rate
|style="background:LightGrey; color:black"|Deposition rate
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'''*''' ''For thicknesses above 600 nm, please request permission.''
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