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Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,792 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,792 edits
Line 26: Line 26:
**0.5 ml/s @ 2.0 bar
**0.5 ml/s @ 2.0 bar
**0.7 ml/s @ 3.0 bar
**0.7 ml/s @ 3.0 bar
*'''SU-8 2035:'''
**0.5 ml/s @ 1.0 bar
*'''SU-8 2010:'''
**1.1 ml/s @ 0.1 bar
*'''KMPR 1025:'''
*'''KMPR 1025:'''
**0.4 ml/s @ 0.5 bar
**0.4 ml/s @ 0.5 bar
**0.7 ml/s @ 1.0 bar
**0.7 ml/s @ 1.0 bar
*'''SU-8 2010:'''
*'''AZ 5214E:'''
**1.1 ml/s @ 0.1 bar*'''AZ 5214E:'''
**1.2 ml/s @ 0.1 bar
**1.2 ml/s @ 0.1 bar
**2.4 ml/s @ 0.18 bar
**2.4 ml/s @ 0.18 bar
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