LabAdviser/314/Microscopy 314-307/SEM/Nova/Transmission Kikuchi diffraction: Difference between revisions

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 [[File:Picture9.png|400px|center|thumb|Fig. 6: Schematic illustration of the on-axis TKD detector configuration.]]
-Moving the detector from a high-angle to the on-axis position permits to reduce the probe current and size to record a solvable pattern. Kikuchi patterns are more intense at small scattering angles (i.e., near the direction of the optical axis) than at higher angles. Therefore, the intensity of the incident electron beam, and thus the probe size needed to record a solvable pattern is smaller when the detector is moved from a high-angle to the on-axis position. The probe size in combination with the beam broadening affect the total interaction volume, and the width of the interaction volume is directly linked to the lateral resolution. All the experiments and results presented in the next section were obtained using the on-axis detector configuration, which has already become the standard geometry for TKD measurements.
+Moving the detector to the on-axis position permits to reduce the probe current and size to record a solvable pattern. Kikuchi patterns are more intense at small scattering angles (i.e., near the direction of the optical axis) than at higher angles. Therefore, the intensity of the incident electron beam, and thus the probe size needed to record a solvable pattern is smaller when the detector is moved from a high-angle to the on-axis position. The probe size in combination with the beam broadening affect the total interaction volume, and the width of the interaction volume is directly linked to the lateral resolution. All the experiments and results presented in the next section were obtained using the on-axis detector configuration, which has already become the standard geometry for TKD measurements.
 = In-situ heating TKD analysis of ultra-thin metal films =