Jump to content

LabAdviser/314/Microscopy 314-307/SEM/Nova/Transmission Kikuchi diffraction: Difference between revisions

Mattod (talk | contribs)
Mattod (talk | contribs)
Line 65: Line 65:


== Nanostructure evolution during heating ==
== Nanostructure evolution during heating ==
Figures 3.12 and 3.13 show the IPFZ maps overlaid with pattern quality
for temperatures varying from 20°C to 900°C.


A preliminary investigation of the Au �lm at room temperature revealed a
A preliminary investigation of the Au �lm at room temperature revealed a
Line 70: Line 73:
range of 30 nm and large grains with size in the 150 nm range. The latter
range of 30 nm and large grains with size in the 150 nm range. The latter
ones showed a strong [111] out-of-plane texture (Fig. 3.11) .
ones showed a strong [111] out-of-plane texture (Fig. 3.11) .
During heating, the [111] grains tended to grow faster than the [110]
and [100] ones. It is also possible to observe that grain growth started at a
temperature below 150°C, while holes are visible at 170°C (highlighted with
a red circle). The holes were formed in the vicinity of non-preferentially
oriented (non-PO) [110] and [100] grains, which were also the site where the
hole growth was continuing. The yellow rectangles follow instead the delayed
hole growth due to the presence of preferentially oriented (PO) [111] grains:
the hole is visible from 170°C and grows until it is completely surrounded
by larger PO grains, subsequently its growth is retarded until 500°C, while
other holes continue to grow.
Since TKD measurements provided a large amount of data for each
scanned point in the map (54000 total acquired points at the step size of 10
nm), statistically signi�cant quantitative data analysis could be performed
from this series of measurements, showing again the big advantage of performing
OIM inside the SEM rather than the TEM. The two classes of grains
already observed in Fig. 3.11 were analyzed, de�ned as i) PO-grains with
[111]//growth direction (using tolerance angle of 15°) and ii) non-PO grains
with other orientations. The average grain size evolution of both classes of
grains is shown in Fig. 3.14a for annealing temperatures up to 600°C.
The graph con�rms the trend from the maps shown in Fig. 3.12, revealing
that grain growth started already at 120°C. The PO grains were larger
than the non-PO ones already from the starting nanostructure and grew
considerably faster: by a temperature of 220°C, PO grains have almost triplicated
their average size, while non-PO grains maintained their average size
of 33 nm. Furthermore, up to 550°C practically only the PO grains grew.
Fig. 3.14b shows the evolution of the number of indexed points for
the two classes of grains, while Fig. 3.14c shows the number of grains of
each class during annealing. The data shows that the fraction of indexed
points and the number of non-PO grains started to decrease at the annealing
temperature of 150°C. Considering that the holes were formed near non-PO
grains as described above, the decrease of non-PO indexed points can be
considered as a signal of hole formation in the �lm, even if holes are not
visible in the image at that temperature. The detailed study of the hole
formation and expansion mechanism is reported in Chapter 4. For PO
grains, the fraction of indexed points kept increasing up to 350°C, while the
number of grains already started to decrease at 180°C, indicating that such
grains kept growing and coalescing before the dewetting process took place.
== Determination of the temperature of formation of the
�rst hole ==
As reported in Subsection 3.4.3, the TKD maps were initially recorded with
a 10 nm step size up to a temperature of 500°C. The holes formed near nonpreferentially
oriented (non-PO) [110] and [100] grains and it was initially
supposed that the decrease of non-PO indexed points from a temperature
of 150°C could be considered as a signal of hole formation in the �lm, even
if the holes were not yet visible in the map.
However, the indexed point number criterion alone is not enough to
evaluate the starting point of the dewetting, because the total number of
indexed points is a convolution of i) points that were initially indexed, but
became not indexed with temperature due to the dewetting of the material
and ii) points that were initially not indexed, due to the relatively large
value of step sized used, but which started to get indexed with temperature
when the growing grains became bigger than the step size. Therefore it has
been necessary to �nd another reliable evaluation criterion to con�rm the
exact starting temperature of formation of the holes in the �lm.
The new criterion used consisted in the evaluation of the quality of the
Kikuchi patterns on the non-indexed areas of the map. Fig. 4.2a shows
the IPFZ map acquired at 210°C: in this map there are several non-mapped
(and therefore black) areas. Fig. 4.2b shows the Kikuchi pattern recorded
from a dewetted area of the sample, while Fig. 4.2c shows the pattern from
an area with very �ne grains (in the range of 10-20 nm). The di�erence
between those two patterns is evident. In c) the Kikuchi pattern is visible,
but indexing was di�cult due to the chosen step size and to the fact that
the grain size was close to the physical resolution of the TKD technique;
thus many patterns originated from grain boundaries were di�cult to be
indexed. In b) no pattern is instead visible, indicating lack of crystalline
material, i.e. only the Si3N4 substrate was present at that position.