LabAdviser/314/Microscopy 314-307/SEM/Nova/Transmission Kikuchi diffraction: Difference between revisions
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for all crystal systems, (iii) high spatial resolutions and (iv) high automatization. OIM can be performed using both SEM and TEM instruments; a schematic representation of an OIM system inside a SEM is shown in Fig. 4. | for all crystal systems, (iii) high spatial resolutions and (iv) high automatization. OIM can be performed using both SEM and TEM instruments; a schematic representation of an OIM system inside a SEM is shown in Fig. 4. | ||
[[File:Picture10.png| | [[File:Picture10.png|400px|center|thumb|Fig. 4: Schematic representation of the principal system components of a SEM-based OIM system.]] | ||
In an OIM scan the beam is stepped across the sample surface in a regular grid. The user typically programs an array of positions, specifying the spatial range and step size of sampling points. At each point the Kikuchi pattern is captured and automatically indexed in real time and the orientation and other information recorded. The acquired OIM data are usually plotted in the form of an inverse pole figure (IPF) orientation map, an example of which is shown in Fig. 5. | In an OIM scan the beam is stepped across the sample surface in a regular grid. The user typically programs an array of positions, specifying the spatial range and step size of sampling points. At each point the Kikuchi pattern is captured and automatically indexed in real time and the orientation and other information recorded. The acquired OIM data are usually plotted in the form of an inverse pole figure (IPF) orientation map, an example of which is shown in Fig. 5. | ||