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Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
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*+ many more ([[#List of available targets for the Sputter-System(Lesker) (03 June 2013)|see list below]] or ask)
*+ many more ([[#List of available targets for the Sputter-System(Lesker) (03 June 2013)|see list below]] or ask)


Contact the pvd-group if you have special needs (pvd@danchip.dtu.dk).
Contact the Thin Film group if you have special needs (thinfilm@danchip.dtu.dk).


====Sputter rate====
====Sputter rate====
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