Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions
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*1 Å/s (Al), 5 Å/s (Ag) | *1 Å/s (Al), 5 Å/s (Ag) | ||
*In general, 0.5-10 Å/s is possible | *In general, 0.5-10 Å/s is possible | ||
*We need to develop a new process each rate | *We need to develop a new process for each rate | ||
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Process parameter range | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Process parameter range | ||