Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF.) The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch. | image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF.) The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch. | ||
image:RCA-HF.jpg|HF baths in RCA bench in B-1. | image:RCA-HF.jpg|HF baths in RCA bench in B-1. | ||
image:Stinkskab RR2.jpg| | image:Stinkskab RR2.jpg|The 5% HF bath in 'Fume hood(RCA)' in cleanroom B-1 is only for use during special RCA cleaning processes inside the fume hood. </gallery> | ||