Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:silver; color:black"|[[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-1| '''DRIE-Pegasus 1''']] | |style="background:silver; color:black"|[[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-1| '''DRIE-Pegasus 1''']] | ||
|style="background:silver; color:black"|[[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2| '''DRIE-Pegasus 2''']] | |||
|style="background:silver; color:black"|[[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3| '''DRIE-Pegasus 3''']] | |||
|style="background:silver; color:black"|[[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4| '''DRIE-Pegasus 4''']] | |||
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!style="background:silver; color:black;" align="center" valign="center" width="80" rowspan="2"|Purpose | !style="background:silver; color:black;" align="center" valign="center" width="80" rowspan="2"|Purpose | ||
|style="background:Whitesmoke; color:black"| Primary | |style="background:Whitesmoke; color:black"| Primary | ||
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* Dry etching of silicon | * Dry etching of 4" silicon | ||
* Dry etching of barc | * Dry etching of barc | ||
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* Research tool | |||
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* Dry etching of 6" silicon | |||
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* Dry etching of 6" dielectrics | |||
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|style="background:LightGrey; color:black"|Alternative | |style="background:LightGrey; color:black"|Alternative | ||
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* Black silicon | * Black silicon | ||
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* Backup dry etching of 6" silicon | |||
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* ? | |||
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* ? | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | ||
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* Standard processes A and B up to 15 µm/min depending on etch load and feature size | * Standard processes A and B up to 15 µm/min depending on etch load and feature size | ||
* Other processes: Any number from 200 nm/min to 10 µm/min | * Other processes: Any number from 200 nm/min to 10 µm/min | ||
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* ? | |||
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* ? | |||
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* ? | |||
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|style="background:LightGrey; color:black"|Uniformity | |style="background:LightGrey; color:black"|Uniformity | ||