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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,580 edits
Line 154: Line 154:
* Quartz wafers need a (semi)conducting layer for clamping
* Quartz wafers need a (semi)conducting layer for clamping
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| style="background:LightGrey; color:black"|Possible masking materials
| style="background:WhiteSmoke; color:black"|Possible masking materials
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* AZ photoresist
* AZ photoresist
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