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Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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<gallery caption="Result of InP etching."  widths="500px" heights="400px" perrow="3">
<gallery caption="Result of InP etching."  widths="500px" heights="400px" perrow="3">


Image:S4_00.jpg
 
Image:S4_01.jpg
Image:S4_01.jpg|Top view: oxide is gone on the narrow lines, low roughness in the trenches.
Image:S4_02.jpg
Image:S4_03.jpg|Top view: low roughness in the trenches.
Image:S4_03.jpg
Image:S4_30dg_midt_10.jpg| 30 dg view: low roughness in the trenches
Image:S4_30dg_midt_10.jpg
Image:S4_30dg_midt_11.jpg|30 dg view: low roughness in the trenches
Image:S4_30dg_midt_11.jpg
Image:S4_midt_05.jpg: top view low roughness in trench and in the large area
Image:S4_30dg08.jpg
 
Image:S4_30dg09.jpg
Image:S4_midt_04.jpg
Image:S4_midt_05.jpg
Image:S4_midt_06.jpg
Image:S4_midt_07.jpg


</gallery>
</gallery>
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