Specific Process Knowledge/Thin film deposition/Temescal: Difference between revisions
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'''The user manual | '''The user manual, user APV, and contact information can be found in LabManager:''' | ||
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[http://labmanager | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 E Beam Evaporator (Temescal) in LabManager] | ||
== Process information == | == Process information == |
Revision as of 10:58, 17 May 2018
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E Beam Evaporator (Temescal)
Write a short description of the equipment(s).
The user manual, user APV, and contact information can be found in LabManager:
E Beam Evaporator (Temescal) in LabManager
Process information
Link to process pages - e.g. one page for each material
Example:
- Etch of silicon using RIE
- Etch of silicon oxide using RIE
- Etch of silicon nitride using RIE
- Etch of photo resist using RIE
Equipment | Equipment 1 | Equipment 2 | |
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Purpose |
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Performance | Response 1 |
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Response 2 |
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Process parameter range | Parameter 1 |
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Parameter 2 |
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Substrates | Batch size |
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Allowed materials |
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