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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 41: Line 41:
|style="background:LightGrey; color:black"|Minimum feature size
|style="background:LightGrey; color:black"|Minimum feature size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1.25µm down to 1.0µm
*1.5µm down to 1µm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1.25µm down to 0.5µm
*1.5µm down to 0.5µm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1.25µm
*1.5µm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*3µm
*2µm down to 1µm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
|-
|-
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