Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
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[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1]] | [[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1]] | ||
Name: M/PLEX ICP - AOE (Advanced Oxide Etcher) <br> | |||
Vendor: STS (now SPTS) <br> | |||
The AOE can be used for dry etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager on the AOE page). | The AOE can be used for dry etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager on the AOE page). | ||