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Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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*Process dependent
*Process dependent
*Tested range: ~20nm/min - ~120nm/min  
*Tested range: ~20nm/min - ~250nm/min  
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*Process dependent
*Process dependent
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