Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
| Line 26: | Line 26: | ||
**0.5 ml/s @ 2.0 bar | **0.5 ml/s @ 2.0 bar | ||
**0.7 ml/s @ 3.0 bar | **0.7 ml/s @ 3.0 bar | ||
*'''KMPR 1025:''' | |||
**?? ml/s @ 0.5 bar | |||
**?? ml/s @ 1.0 bar | |||
**?? ml/s @ 2.0 bar | |||
*'''SU-8 2010:''' | *'''SU-8 2010:''' | ||
**1.1 ml/s @ 0.1 bar | **1.1 ml/s @ 0.1 bar*'''AZ 5214E:''' | ||
*'''AZ 5214E:''' | |||
**1.2 ml/s @ 0.1 bar | **1.2 ml/s @ 0.1 bar | ||
**2.4 ml/s @ 0.18 bar | **2.4 ml/s @ 0.18 bar | ||