Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>Si Etch 03 Fume hood 06</b> | |style="background:WhiteSmoke; color:black"|<b>Si Etch 03 Fume hood 06</b> | ||
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!style="background: | !style="background:Silver; color:black;" align="center" width="60" rowspan="2"|Purpose | ||
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*Etch of Silicon in 28 wt% KOH | *Etch of Silicon in 28 wt% KOH | ||
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*:[http://kemibrug.dk/KBA/CAS/106882/?show_KBA=1&portaldesign=1 see KBA here] | *:[http://kemibrug.dk/KBA/CAS/106882/?show_KBA=1&portaldesign=1 see KBA here] | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan=" | !style="background:silver; color:black" align="center" valign="center" rowspan="7"|Performance | ||
|style="background:LightGrey; color:black"|Etch rates in crystalline silicon (100) | |style="background:LightGrey; color:black"|Etch rates in crystalline silicon (100) | ||
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