LabAdviser/Courses

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Courses

We are building up a number of courses to educate our users in using the cleanroom facility and the equipment inside. Below you can see the courses that are presently running. The "Cleanroom introduction Course" is mandatory for all users that need to enter the cleanroom facility on their own. Then there is a number of TPT's (Tool Package Training Courses) that you need to attend depending on which kind of tool you need to use inside the facility.

The Cleanroom Introduction Course

For information regarding the Introduction Course, please take a look at the DTU Danchip homepage, a direct link is given here: [1]

The Lithography TPT

DTU Danchip offers a Tool Package Training in Lithography; the course includes theory on lithographic processes and equipment, as well as training in equipment operation and processing in the cleanroom.

The course is for all users that intend to perform any kind of lithographic processing in the cleanroom, and is a prerequisite for training in other lithography equipment.

Lithography Tool Package Training
Schedule	Theoretical part The lecture has been replaced by videos that can be viewed at one's leisure. A 1 hour "questions and exercises" session once or twice a month will be planned as needed (typically Fridays 09:30-10:30). Sign up via Q&E session Doodle Practical part A 4-5 hour training session 2-3 times a month, max. 4 persons per session (typically Wednesdays 09:00 - 14:00). Sign up via Training session Doodle
Location	Theoretical part The location of the "questions and exercises" session will be specified after signing up for the course. Practical part The training session takes place inside the cleanroom. The meeting point will be in front of the first equipment.
Qualified Prerequisites	Cleanroom safety course at DTU Danchip Admission to the cleanroom must be obtained before the training session
Preparations	Before the "questions and exercises" session Read Sami Franssila "Introduction to Microfabrication" (2010), Chapter 9: Optical Lithography (Available online from DTU campus). Watch the lecture videos (7 videos, 2:41 hours in total). Write down any questions that may arise during the videos. Before training session Watch the training videos of spin coating (automatic), exposure (operation + alignment), and development (automatic). Study the equipment manuals. The manuals are available in LabManager. Study the TPT process flows (first print + alignment). Links to literature, lecture videos, training videos, equipment manuals, and process flows can be found in the section below.
Course Responsible	The Lithography Group at DTU Danchip lithography@danchip.dtu.dk. Sign up for the course using Doodle (links under schedule).
Learning Objectives	Describe fundamental parts of lithographic processing in a cleanroom, design of process flows Authorization to use spin coater, mask aligner, and developer at DTU Danchip Calculate relevant process parameters Analyze and apply your results of lithographic processing

Material for preparations and further information

Literature Franssila, 2010, Chapter 9: Optical Lithography Franssila, 2010, Chapter 10: Advanced Lithography Lithography Troubleshooter from MicroChemicals Application Notes from MicroChemicals Lecture videos Lecture videos (7 videos, 2:41 hours in total) Slides from Lecture TPT slides: Introduction TPT slides: Spin Coating TPT slides: UV Exposure TPT slides: Development TPT slides: Post-processing TPT slides: Process Effects and Examples	Training videos Training Video: Automatic Spin Coater Training Video: UV Mask Aligner Part I (Operation) Training Video: UV Mask Aligner Part II (Alignment) Training Video: Automatic Puddle Developer Manuals Automatic Spin Coater: Spin Coater: Gamma UV UV Mask Aligner: Aligner: MA6 - 2 or KS Aligner Automatic Puddle Developer: Developer: TMAH UV-lithography Process Flows TPT first print process flow TPT alignment process flow

Mask Design

DTU Danchip offers a Tool Package Training in Mask Design.

The course is for all users who intend to design their own masks for lithography.

Mask Design Training
Schedule	Self-study using screen cast videoes demonstrating the use of either CleWin og L-edit. An exercise where you are guided through the design of a mask. An optional ½ hour Q&A session with an expert on mask layout. You can make an appointment after finishing the exercise.
Location	Anywhere you like. DTU network access required.
Qualified Prerequisites	Basic knowledge about micro-lithography Access to a computer where you can install Clewin or L-edit Danchip provide free access to use Clewin 5 through a network license. If you want to use L-edit you will need a valid license of your own Basic knowledge about micro-fabrication techniques
Preparations	None
Course Responsible	Customer support at DTU Danchip. If you have questions you can contact us by e-mailing danchipsupport@danchip.dtu.dk.
Learning Objectives	Get acquainted with either Clewin 5 or L-edit mask design programs construct and manipulate basic shapes (rectangles, polygons, circles etc.) use mask layers and hierarchical mask design choose mask polarity and orientation for different resist types and Front/Back-side alignment select and design appropriate test structures and alignment marks for a process make a chip/wafer layout usable for dicing export the layout to cif or gds files with appropriate layer names make a mask order

Material for the Mask Design course

Literature Beginners guide to Clewin v1.31 L-Edit User Guide Clewin 5 User Guide	Training videos Clewin 5 L-Edit (5 videos)	Exercises Exercise for Clewin 5 Exercise for L-Edit

The Dry Etch TPT

DTU Danchip offers a Tool Package Training in Dry etching; the course includes theory on dry etching and equipment, as well as training in equipment operation in the cleanroom.

The course is for all users who intend to perform any kind of plasma dry etching in the cleanroom, and is a prerequisite for training in any of the plasma dry etch equipment's.

Dry Etch Tool Package Training
Schedule	Theoretical part A 3-hour lecture. The next 3 hour lecture is on the 21st of September from 9:00 to approximately 12. Sign up via: Dry Etch TPT Lecture doodle Practical part A 2-3 hour training session, max. 3 persons per session will be planed after the lecture
Location	Theoretical part The location of the lecture will be notified after you have signed up Practical part The training session takes place inside the cleanroom. The meeting point will be in The gowning area
Qualified Prerequisites	Cleanroom safety course at DTU Danchip Admission to the cleanroom must be obtained before the training session
Preparations	Before the lecture Watch the video:Introduction to Dry Etch Equipment Before training session Watch the training video: TPT hands-on intro Watch the screen cast video's for the ASE/AOE software:See below Watch the screen cast video's for the DRIE/ICP meat and III-V ICP: See below
Course Responsible	The Dry Etch Group at DTU Danchip. If you have questions you can contact us by e-mailing dryetch@danchip.dtu.dk.
Learning Objectives	Know why and when to use dry etching Use the dry etchers without harming the machines Select the right instrument to use for his/her dry etch processing Select an appropriate etch recipe for his/her dry etch processing Spot when the recipe needs to be tuned for his/her needs and Suggest relevant tuning parameters

Material for preparations and further information

Literature No extra Literature at the moment Pre Lecture video Introduction to Dry Etch Equipment 5min37s Slides from Lecture Lecture slide show Media:TPT Dry etching Aug2017.pptx Lecture slides with explanatory text included Media:TPT Dry etching Aug2017.pdf	Pre hands-on training videos TPT hands-on intro 6min6s Screen cast videos for the DRIE, ICP metal and III-V ICP: Overview 3min25s Running processes Recipes The Bosch Processes Automatic processing at the DRIE-Pegasus 14min56s Screen cast videos for the ASE and AOE: Intro Load and Transfer Recipe Editor The Bosch Process Run a Process Removing a Wafer from the Load Lock The Process Log

The SEM TPT

DTU Danchip offers a Tool Package Training in Scanning electron microscope (SEM); the course includes theory on SEM, as well as training in instrument operation.

The course is for all users who intend to perform any kind of SEM related process and is a prerequisite for training in any of the SEM at Danchip.

SEM Tool Package Training
Schedule	Theoretical part A 3-hour lecture. The next two 3 hour lectures are on the 14th and 28th of April from 9:00 to approximately 12.00. Practical part A 2-hour training session, max. 3 persons per session will be planed after the lecture A 2-hour one-on-one hands-on session which will request the participant to pass a “driving test” on the SEM. In this session, the participant will have the opportunity to study their own sample
Location	Theoretical part The location of the lecture will be notified after you have signed up Practical part The training session takes place building 346 room 907(basement). The meeting point will be at the SEM Supra 1
Qualified Prerequisites
Preparations	Before the lecture Read “Scanning Electron Microscopy Primer” by Bob Hafner and some notes that lists some differences between the SEMs described in the primer and the SEMs at Danchip. You can find it on the cleanroom drive: U:\DCH\CleanroomDrive\_TPT\TPT SEM\Learning material, or the primer can be found here Before the first group training session Watch the training videos: You can find it on the cleanroom drive: U:\DCH\CleanroomDrive\_TPT\TPT SEM\Training videos (will be the Link to the video later) Watch the training videos: You can find it on the cleanroom drive: [U:\DCH\CleanroomDrive\_TPT\TPT SEM\Training videos] (will be the Link to the video later) Before the one-on-one hands-on Look at the presentation Media:Operating_SEM_Supra_1_final.pptx Read the user manual for SEM Supra 1 Click here
Course Responsible	The SEM Group at DTU Danchip (SEM@danchip.dtu.dk). Sign up for the course by e-mailing to sem@danchip.dtu.dk.
Learning Objectives	Prepare samples and safely operate SEM Understand possibilities and limitations of SEM Explain SEM electron optics and detectors Optimize and analyse SEM images

Material for preparations and further information

Slides from Lecture

• Lecture slide show Media:Danchip_SEM_lecture.pptx