Specific Process Knowledge/Etch/Wet Aluminium Etch: Difference between revisions
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!Link to KBA | !Link to KBA | ||
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[ | [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhES0xFTEZMVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K SDS in Kemibrug] | ||
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[http://kemibrug.dk/KBA/CAS/106779/?show_KBA=1&portaldesign=1 | [http://kemibrug.dk/KBA/CAS/106779/?show_KBA=1&portaldesign=1 SDS: Not available] | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Process temperature | !Process temperature | ||
|50 <sup>o</sup>C | |50<sup>o</sup>C | ||
|20 <sup>o</sup>C | |20<sup>o</sup>C | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Batch size | !Batch size | ||
|1-25 wafers at a time | |1-25 wafers at a time | ||
|1-25 wafer at a time | |1-25 wafer at a time | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Size of substrate | !Size of substrate | ||
|4" wafers | |*4" wafers | ||
*6" wafers | |||
|4" wafers | |4" wafers | ||
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*Aluminium | *Aluminium | ||
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*Photoresist | *Photoresist | ||
*E-beam resist | *E-beam resist | ||
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|} | |} | ||