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Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, danchip
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Choi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, danchip
641 edits
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!'''Allowed materials'''
!'''Allowed materials'''
|
|In bath:
*Aluminium
*See Cross Contamination Sheet for
*Silicon
In beaker:
*Silicon Oxide
*Any material
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*E-beam resist
|
|
*Every thing that is allowed in the Developer: TMAH Manual
*Every thing that is allowed in the Developer: TMAH Manual
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