Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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|style="background:LightGrey; color:black"|Resolution xy | |style="background:LightGrey; color:black"|Resolution xy | ||
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Down to 0.003 µm | |||
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|style="background:LightGrey; color:black"|Resolution z | |style="background:LightGrey; color:black"|Resolution z | ||
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1 Å, 10 Å, 80 Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively) | |||
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|style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W | |style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W | ||
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1.2(W[µm]-5µm) | 1.2*(W[µm]-5µm) | ||
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|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
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* | *Up to 6" | ||
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| style="background:LightGrey; color:black"|Substrate material allowed | | style="background:LightGrey; color:black"|Substrate material allowed | ||