Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 '''Feedback to this section''': '''[mailto:lithography@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01 click here]'''
-The K&W MA1006 mask aligner located in the III-V cleanroom is dedicated for processing of III-V compound semiconductors.
+The MLA 100 Maskless Aligner located in the E-5 cleanroom is direct write lithography tool.
+It is UV exposure system, that exposes the patterns directly on photosensitive resists on chips, 2, 4, and 6 inch substrates, without prior fabrication of the mask.
-Specific use of the mask aligner can be found in the standard resist recipes.
+The system offers an alignment option with high accuracy.
 [[Image:IMG_3078.jpg|300x300px|thumb|III-V Aligner positioned in A-5]]